Quantum dot color conversion is a key technology to fabricate full-color display panels. Because the optical performance of color conversion films is strongly correlated with the dispersion and concentration of quantum dots in the composite films, high loading quantum dots solution is of great importance. Herein, we fabricate a series of poly(ethylene glycol) (PEG)-ylated quantum dots in neutral solvents such as propylene glycol monomethyl ether acetate (PGMEA) and ethylene glycol dimethacrylate (EGDMA), achieving a maximum concentration of 50 wt% with a maximum photoluminescence quantum yield of ~96%. Using PEGylated QDs in EGDMA, we developed quantum dot photoresist to fabricate color conversion patterns, achieving a high blue-light absorption over 90% at 450 nm with a photo conversion efficiency exceeding 55%. Furthermore, high-resolution color conversion patterns with a pixel density of up to 2450 pixels per inch (PPI) were successfully fabricated via direct photolithography. This work not only provides advanced materials for fabricating color conversion patterns for display application, but also opens up new opportunities for other technology.