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Research Article | Open Access | Just Accepted

High concentration PEGylated quantum dot solution for color conversion applications

Qingchen Wang1Jiaming Su1Xian-gang Wu2Yuyu Jing1Dengbao Han2Jianbing Shi1( )Haizheng Zhong1 ( )

1 MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, School of Materials Science and Engineering, Beijing Institute of Technology, Beijing 100081, China

2 Hefei Innovation Research Institute of Beihang University, Hefei 230012, China

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Abstract

Quantum dot color conversion is a key technology to fabricate full-color display panels. Because the optical performance of color conversion films is strongly correlated with the dispersion and concentration of quantum dots in the composite films, high loading quantum dots solution is of great importance. Herein, we fabricate a series of poly(ethylene glycol) (PEG)-ylated quantum dots in neutral solvents such as propylene glycol monomethyl ether acetate (PGMEA) and ethylene glycol dimethacrylate (EGDMA), achieving a maximum concentration of 50 wt% with a maximum photoluminescence quantum yield of ~96%. Using PEGylated QDs in EGDMA, we developed quantum dot photoresist to fabricate color conversion patterns, achieving a high blue-light absorption over 90% at 450 nm with a photo conversion efficiency exceeding 55%. Furthermore, high-resolution color conversion patterns with a pixel density of up to 2450 pixels per inch (PPI) were successfully fabricated via direct photolithography. This work not only provides advanced materials for fabricating color conversion patterns for display application, but also opens up new opportunities for other technology.

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Review Status: {{reviewData.commendedNum}} Commended , {{reviewData.revisionRequiredNum}} Revision Required , {{reviewData.notCommendedNum}} Not Commended Under Peer Review

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Cite this article:
Wang Q, Su J, Wu X-g, et al. High concentration PEGylated quantum dot solution for color conversion applications. Nano Research, 2026, https://doi.org/10.26599/NR.2026.94908956

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Received: 31 March 2026
Revised: 28 May 2026
Accepted: 19 June 2026
Available online: 19 June 2026

© The Author(s) 2026. Published by Tsinghua University Press.

This is an open access article under the terms of the Creative Commons Attribution 4.0 International License (CC BY 4.0, https://creativecommons.org/licenses/by/4.0/)