Single-crystal diamond has attracted much attention because of its wide bandgap and specific thermal and optical properties, which is suitable for the utilization on integrated photonic devices and power semiconductor devices. However, its extremely high hardness confines the processing ability of micro/nano structures, which is the main determinant of devices performance. Here, multimode patterning methods using ultrafast laser regulated in spatial-domain with high precision are proposed. Through designing of spatial beam phase, specific patterned micro/nano structures ranging from sub-micrometer scale to millimeter scale can be printed on diamond surface with improved efficiency. This provides a facile strategy for the fabrication of programmable patterns with sub-wavelength resolutions. The laser ablation and graphitization result can be precisely predicted by calculating free electron density and validated through patterning experiment. A diamond holographic element is designed and fabricated through the proposed method, which can project the reconstructed holographic image for display applications. This work presents a promising method for preparing of single-crystal diamond-based next-generation semiconductor devices and integrated photonic systems requiring precise light field control.