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Friction
ISSN 2223-7690
e-ISSN 2223-7704
CN 10-1237/TH
Editor-in-Chief: Jianbin Luo
Open Access
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post-CMP cleaning
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Review Article
Scratch formation and its mechanism in chemical mechanical planarization (CMP)
Tae-Young KWON, Manivannan RAMACHANDRAN, Jin-Goo PARK
https://doi.org/10.1007/s40544-013-0026-y
Published: 14 November 2013
2013, 1 (4): 279-305
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