Friction

ISSN 2223-7690 e-ISSN 2223-7704 CN 10-1237/TH
Editor-in-Chief: Jianbin Luo
Open Access
Journal Home
Articles & Issues
Articles & Issues Latest Issue All Issues
× New Search
Advanced Search
Journal Home > Keyword
Keyword: Chemical mechanical planarization (CMP)
Search in: this journal | the platform
Open Access Review Article
Scratch formation and its mechanism in chemical mechanical planarization (CMP)
Tae-Young KWON, Manivannan RAMACHANDRAN, Jin-Goo PARK
https://doi.org/10.1007/s40544-013-0026-y
Published: 14 November 2013
2013, 1 (4): 279-305
Downloads: 224 | Views: 1224 | PDF (2.6 MB)
total 1