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Open Access

Investigation and Application of Small-Strain Model Parameters for Soft Clay Deposits

Weidong Wang1,2( ), Qing Li1,2, Zhanghua Xu1,2, Ludan Zong1,2, Yaoliang Li3
East China Architecture Design & Research Institute Co., Ltd., Shanghai 200011, P. R. China
Shanghai Engineering Research Center of Safety Control for Facilities Adjacent to Deep Excavations, Shanghai 200011, P. R. China
Shanghai Foundation Engineering Co., Ltd., Shanghai 200433, P. R. China
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Abstract

Non-linear stiffness at small strains is one of important intrinsic soil features and is vital to finite element analysis of deep excavations. This paper introduces determination of HS-Small model parameters for typical Shanghai clay layers (② ~ ⑥)through a series of laboratory tests. A method by which stiffness parameters Eoedref, E50ref, Eurref and small strain shear modulus G0ref can be deduced from compression modulus Es1-2 has been proposed. The values of parameters Rf,m,vur,γ0.7 are also suggested. Together with shear strength parameters of c′、φ′ provided in geotechnical investigation report, the HS-Small model parameters are determined. Finally, Based on the small strain model parameters determined by this method, the three-dimensional numerical analysis of Yunlingxi ultra-deep shaft structure of Shanghai deep tunnel drainage system is carried out, and the applicability of small strain constitutive model in ultra-deep foundation pit engineering is verified.

CLC number: TU411 Document code: A Article ID: 1673-0836(2023)03-0844-12

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Chinese Journal of Underground Space and Engineering
Pages 844-855

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Cite this article:
Wang W, Li Q, Xu Z, et al. Investigation and Application of Small-Strain Model Parameters for Soft Clay Deposits. Chinese Journal of Underground Space and Engineering, 2023, 19(3): 844-855. https://doi.org/10.20174/j.juse.2023.03.015

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Received: 23 November 2022
Published: 01 June 2023
© 2023 Chinese Journal of Underground Space and Engineering

This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/).