Friction

ISSN 2223-7690 e-ISSN 2223-7704 CN 10-1237/TH
Editor-in-Chief: Jianbin Luo
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Keyword: chemical-mechanical planarization (CMP)
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Open Access Research Article
Y2O3 nanosheets as slurry abrasives for chemical-mechanical planarization of copper
Xingliang HE, Yunyun CHEN, Huijia ZHAO, [...], Haoming SUN, Xinchun LU, Hong LIANG << Fewer
https://doi.org/10.1007/s40544-013-0017-z
Published: 20 July 2013
2013, 1 (4): 327-332
Downloads: 28 | Views: 635 | PDF (824.9 KB)
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