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Open Access

Manufacturing microelectrode with automation control: A critical review

Ning WANGaWentao SUNa,bYonghao LIUaJuanjuan LIc( )Yongqiang ZHUaXiaowei WANGbGuixue BIANdXiangyi LIUeLin WANG5Dazhao YUeFeng WANGfJiantao QIa( )
College of New Energy, China University of Petroleum (East China), Qingdao 266580, China
Aviation Industry Corporation of China, Ltd., Luoyang 471027, China
Henan Institute of Special Equipment Inspection Technology, Zhengzhou 450000, China
Naval Aeronautical University, Qingdao 266041,China
Naval University, Yantai 264001, China
Henan Research Institute of Boiler and Pressure Vessel Inspection Technology, Zhengzhou 450003, China

Peer review under responsibility of Editorial Committee of JAMST

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Abstract

Electroplating at the micro and nano scales is an electrochemical deposition technique, regarded as one additive manufacturing process, to achieve the preparation and surface modification of nano devices. The present review mainly discussed two key inflcuing factors including microelectrode probe manufacturing (the length of tapered needle tipe and diameter of microelectrode tip) and the distance automation control in the micro and nano dimension between microelectrode and substrate. In addition, the mechanism and application of electrochemical etching for different microelectrode tips and automation control systems are focused. Finally, the challenges and prospect in electroplating at micro and nano scales were discussed.

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Journal of Advanced Manufacturing Science and Technology
Article number: 2024008

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Cite this article:
WANG N, SUN W, LIU Y, et al. Manufacturing microelectrode with automation control: A critical review. Journal of Advanced Manufacturing Science and Technology, 2024, 4(3): 2024008. https://doi.org/10.51393/j.jamst.2024008

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Received: 11 January 2024
Revised: 16 January 2024
Accepted: 26 January 2024
Published: 15 July 2024
© 2024 JAMST

This is an Open Access article distributed under the terms of the Creative Commons Attribution License http://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.