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Article | Open Access

Enhancing Power Enterprise Inspection and Supervision: A LoRA-Based Lightweight LLM Framework Integrating Retrieval-Augmented Generation and Prompt Engineering

Jianfeng Liu1Yongjiao Yang1Kangyi Yang1Changhua Hu1Zijia Xu1Qingguo Shi2Yi Su2( )
Guangdong Power Grid Co., Ltd., Zhongshan, China
Faculty of Automation and Electronic Information, Xiangtan University, Xiangtan, China
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Abstract

Power enterprise inspection and supervision require greater intelligence, efficiency, and standardization; however, existing approaches are limited by inefficient knowledge retrieval, inaccurate issue identification, and insufficient support for standardized reporting and rectification tracking. This study proposes a lightweight, domain-adaptive large language model (LLM) framework based on Low-Rank Adaptation (LoRA), integrating Retrieval-Augmented Generation (RAG) and structured prompt engineering to enable evidence-grounded inspection tasks. The framework achieves parameter-efficient adaptation through low-rank decomposition and constructs a domain-specific multimodal knowledge base, enhancing output traceability, consistency, and task generalization. A key contribution is the introduction of a Sensitive Information Control Gate, which enforces role-based access control and automated redaction, ensuring secure and compliant generation in regulated environments while preserving traceability. Experimental results demonstrate that the proposed method achieves improved performance over the base model and demonstrates competitive effectiveness under the evaluated conditions, supported by statistical analysis (paired t-test, p < 0.01, bootstrap 95% confidence intervals), while maintaining high parameter efficiency with only 0.4%–0.5% trainable parameters.

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Computers, Materials & Continua
Article number: 95

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Cite this article:
Liu J, Yang Y, Yang K, et al. Enhancing Power Enterprise Inspection and Supervision: A LoRA-Based Lightweight LLM Framework Integrating Retrieval-Augmented Generation and Prompt Engineering. Computers, Materials & Continua, 2026, 88(2): 95. https://doi.org/10.32604/cmc.2026.082804

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Received: 23 March 2026
Accepted: 08 May 2026
Published: 15 June 2026
© The Author 2026.

This work is licensed under a Creative Commons Attribution 4.0 International License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.