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Article | Open Access

Multiscale Simulation of Microstructure Evolution during Preparation and Service Processes of Physical Vapor Deposited c-TiAlN Coatings

Yehao LongJing Zhong( )Tongdi ZhangLi ChenLijun Zhang( )
State Key Laboratory of Powder Metallurgy, Central South University, Changsha, 410083, China
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Abstract

Physical Vapor Deposited (PVD) TiAlN coatings are extensively utilized as protective layers for cutting tools, renowned for their excellent comprehensive performance. To optimize quality control of TiAlN coatings for cutting tools, a multi-scale simulation approach is proposed that encompasses the microstructure evolution of coatings considering the entire preparation and service lifecycle of PVD TiAlN coatings. This scheme employs phase-field simulation to capture the essential microstructure of the PVD-prepared TiAlN coatings. Moreover, cutting simulation is used to determine the service temperature experienced during cutting processes at varying rates. Cahn-Hilliard modeling is finally utilized to consume the microstructure and service condition data to acquaint the microstructure evolution of TiAlN coatings throughout the cutting processes. This methodology effectively establishes a correlation between service temperature and its impact on the microstructure evolution of TiAlN coatings. It is expected that the present multi-scale numerical simulation approach will provide innovative strategies for assisting property design and lifespan prediction of TiAlN coatings.

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Computers, Materials & Continua
Pages 3435-3453

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Cite this article:
Long Y, Zhong J, Zhang T, et al. Multiscale Simulation of Microstructure Evolution during Preparation and Service Processes of Physical Vapor Deposited c-TiAlN Coatings. Computers, Materials & Continua, 2024, 79(3): 3435-3453. https://doi.org/10.32604/cmc.2024.051629

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Received: 11 March 2024
Accepted: 09 May 2024
Published: 30 June 2024
© The Author 2024.

This work is licensed under a Creative Commons Attribution 4.0 International License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.