AI Chat Paper
Note: Please note that the following content is generated by AMiner AI. SciOpen does not take any responsibility related to this content.
{{lang === 'zh_CN' ? '文章概述' : 'Summary'}}
{{lang === 'en_US' ? '中' : 'Eng'}}
Chat more with AI
PDF (5 MB)
Collect
Submit Manuscript AI Chat Paper
Show Outline
Outline
Show full outline
Hide outline
Outline
Show full outline
Hide outline
Research Article | Open Access | Just Accepted

Template-guided stacking regulation and morphology evolution of multilayer 2H- and 3R-WS2 during layer-by-layer epitaxy

Yuefan Peng1,§Buqian Zhao1,§Zengqi Chen1Junsheng Bao1Haomiao Wang1Yifan Liu1( )Weihao Zheng2( )Xiaopeng Fan1( )

1 College of Physics and Optoelectronic Engineering, College of Integrated Circuits, Taiyuan University of Technology, Taiyuan 030024, China

2 College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha 410073, China

§ Yuefan Peng and Buqian Zhao contributed equally to this work.

Show Author Information

Abstract

Two-dimensional layered materials have attracted extensive interest owing to their highly tunable electronic and optoelectronic properties associated with layer number and interlayer stacking. Tungsten disulfide (WS2), a representative transition metal dichalcogenide, mainly adopts 2H and 3R stacking configurations in multilayer form, which exhibit distinct crystal symmetries and nonlinear optical responses. However, how template-guided stacking evolution influences the layer and morphology evolution of multilayer WS2 during layer-by-layer epitaxy remains insufficiently understood. Herein, we demonstrate a WS2-template-guided van der Waals epitaxial strategy to regulate the stacking propagation pathways and morphology evolution of multilayer WS2. Under the combined effects of template-guided epitaxial regulation and deposition-temperature-dependent stacking evolution, distinct stacking propagation pathways preferentially lead to AB-stacked 2H-WS2 and ABC-stacked 3R-WS2. Notably, multilayer 2H-WS2 exhibits asynchronous layer-dependent morphology evolution from triangular to hexagonal tower-like structures, whereas 3R-WS2 maintains a self-similar pyramidal growth pathway with highly ordered stacking propagation. Atomic force microscopy (AFM) and second harmonic generation (SHG) mapping further establish the intrinsic correlation among stacking evolution, layer evolution, morphology evolution, and symmetry response in multilayer WS2, including odd-even SHG oscillation in 2H-WS2 and progressively enhanced SHG response in multilayer 3R-WS2. These findings provide new insights into template-guided stacking regulation during multilayer van der Waals epitaxy, offering a potential strategy for the controllable structural engineering of layered transition metal dichalcogenide materials.

Graphical Abstract

References

【1】
【1】
 
 
Nano Research

{{item.num}}

Comments on this article

Go to comment

< Back to all reports

Review Status: {{reviewData.commendedNum}} Commended , {{reviewData.revisionRequiredNum}} Revision Required , {{reviewData.notCommendedNum}} Not Commended Under Peer Review

Review Comment

Close
Close
Cite this article:
Peng Y, Zhao B, Chen Z, et al. Template-guided stacking regulation and morphology evolution of multilayer 2H- and 3R-WS2 during layer-by-layer epitaxy. Nano Research, 2026, https://doi.org/10.26599/NR.2026.94909111
Topics:

92

Views

16

Downloads

0

Crossref

0

Web of Science

0

Scopus

0

CSCD

Received: 15 June 2026
Revised: 02 August 2026
Accepted: 13 August 2026
Available online: 13 August 2026

© The Author(s) 2026. Published by Tsinghua University Press.

This is an open access article under the terms of the Creative Commons Attribution 4.0 International License (CC BY 4.0, https://creativecommons.org/licenses/by/4.0/)