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Review Article | Open Access | Just Accepted

Hafnium-based ferroelectric devices for neuromorphic computing: From materials physics to systems

Zhenhua Song1,§Xiumin Xu1,§Jianxiu Liu4Ruihong Ruan2Xingcan Guo2Wenhao Chen2Tianxing Wei2Jiajie Yu2Qingxuan Li1Yiqun Hu1( )Zihan Liu1Qingqing Sun2,3David Wei Zhang2,3Zhenhai Li1( )Lin Chen2,3( )

1 School of Integrated Circuits, Anhui University, Hefei 230601, China

2 College of Integrated Circuits & Micro-Nano Electronics, Fudan University, Shanghai 200433, China

3 Nano Institute of Fudan University, Shanghai 201203, China

4 School of Electronic Informatio, Anhui Audit College, Hefei 230601, China

§ Zhenhua Song and Xiumin Xu contributed equally to this work.

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Abstract

Technological progress is advancing at a rapid pace, and the rate of chip performance improvements and transistor density increases is gradually diverging from Moore's Law predictions. Simultaneously, the "memory wall" and "power wall" challenges inherent in the von Neumann architecture have become increasingly prominent. Today, neuromorphic computing—inspired by the human brain—is emerging as one of the most promising computational paradigms. To realize efficient brain-like hardware, a high-performance, scalable, non-volatile memory device is essential. Among these, ferroelectric field-effect transistors (FeFETs) based on hafnium oxide (HfO₂) stand out as the most representative. It effectively mimics biological synaptic plasticity while offering high compatibility with CMOS processes, excellent scalability, fast low-power switching characteristics, and inherent controllable three-terminal field-effect properties.

The paper systematically reviews the research progress of HfO₂-based ferroelectric devices in the field of neuromorphic computing. Starting from the ferroelectric physical properties of HfO₂, it first discusses engineering regulation of the ferroelectric phase through methods such as doping and strain, and elaborates on the associated material-level challenges. Building upon this foundation, this review discusses representative HfO₂-based ferroelectric device architectures, including FeFETs, ferroelectric tunnel junctions (FTJs), ferroelectric diodes (Fe-diodes), and advanced fin field-effect transistor (FinFET)/nanowire ferroelectric transistors. The primary focus is on their applications in simulating biological synapses and neurons, along with the impact on performance optimization. The study also extends from devices to system-level integration, addressing issues such as the non-idealities in crossbar arrays, power consumption in peripheral circuits, and challenges in hardware-software co-design. Finally, this research comprehensively summarizes the significant challenges currently facing science and technology from multiple perspectives and proposes several promising solutions. Through comprehensive research, this paper identifies contemporary development directions: integrated applications of two-dimensional ferroelectric materials, exploration of novel computational paradigms, and convergence of sensing, storage, and computation. It aims to provide a comprehensive reference framework for future research in this field.

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Cite this article:
Song Z, Xu X, Liu J, et al. Hafnium-based ferroelectric devices for neuromorphic computing: From materials physics to systems. Nano Research, 2026, https://doi.org/10.26599/NR.2026.94908925
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Received: 10 April 2026
Revised: 28 May 2026
Accepted: 08 June 2026
Available online: 08 June 2026

© The Author(s) 2026. Published by Tsinghua University Press.

This is an open access article under the terms of the Creative Commons Attribution 4.0 International License (CC BY 4.0, https://creativecommons.org/licenses/by/4.0/)