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Research Article | Open Access | Just Accepted

Robust n-type conduction with high on/off ratios in violet phosphorus field-effect transistors

Jae Joon Kim1Joonho Kim1Seoyoung Lim2,3Dong-gyu Kim1Uje Choi1Jieun Yeon1Jinsub Park1Dong-Wook Kim2,3Kwanpyo Kim1( )

1 Department of Physics, Yonsei University, Seoul 03722, Republic of Korea

2 Department of Physics, Ewha Womans University, Seoul 03760, Republic of Korea

3 Institute for Multiscale Matter and Systems (IMMS), Ewha Womans University, Seoul 03760, Republic of Korea

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Abstract

Elemental phosphorus exhibits a rich polymorphism, and violet phosphorus (VP) has recently emerged as a layered semiconductor of interest for electronic and optoelectronic applications. However, its intrinsic charge-transport behavior has remained elusive, largely obscured by suboptimal device integration, low interface quality, and environmental degradation. Here, we report the fabrication and systematic characterization of multi-gate field-effect transistors based on high-quality VP crystals. To preserve the pristine nature of the channel, we employ a van der Waals heterostructure architecture featuring full hexagonal boron nitride encapsulation and high-quality electrical contacts using either pre-patterned bottom electrodes or graphite contacts. Our devices exhibit robust n-type conduction with ohmic-like contact behavior, achieving Ion/Ioff current ratios approaching 107 and long-term ambient stability. Notably, the n-type characteristics persist independent of the contact metal work function. Comprehensive dual-gate modulation and temperature-dependent analyses confirm clear unipolar n-type behavior of the VP channel. These findings clarify the inherent transport nature of VP and underscore the critical role of interface engineering in unlocking its full potential for advanced multifunctional electronic and optoelectronic devices.

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Cite this article:
Kim JJ, Kim J, Lim S, et al. Robust n-type conduction with high on/off ratios in violet phosphorus field-effect transistors. Nano Research, 2026, https://doi.org/10.26599/NR.2026.94908865

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Received: 25 February 2026
Revised: 17 April 2026
Accepted: 22 May 2026
Available online: 22 May 2026

© The Author(s) 2026. Published by Tsinghua University Press.

This is an open access article under the terms of the Creative Commons Attribution 4.0 International License (CC BY 4.0, https://creativecommons.org/licenses/by/4.0/)