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Open Access

Design and Manufacture of Dual-gate DDSCR with High Failure Current and Holding Voltage

Xingtao Bao1,2Yang Wang3Yujie Liu1,2Xiangliang Jin1,2( )
School of Physics and Electronics, Hunan Normal University, Changsha 410081, China
Key Laboratory of Physics and Devices in the Post-Moore Era, Hunan Normal University, Changsha 410081, China
School of Integrated Circuits, Peking University, Beijing 100871, China
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Abstract

High-voltage controller area network (CAN) buses have a harsh working environment and require a robust electrostatic discharge (ESD) design window. Thus, ordinary silicon-controlled rectifier (SCR) devices do not satisfy these design requirements. To streamline the design and manufacturing of SCRs, this study proposes a novel dual-gate dual-direction SCR (DG-DDSCR) with a high failure current and holding voltage. First, four polysilicon gates, GateA1, GateA2, GateC1, and GateC2, were introduced to the N+ and P+ middle regions of the anode and cathode. When the voltage acts on the anode, the electric field generated by the polysilicon gate strengthens the SCR current path while promoting the release of ESD current in the substrate path. Specifically, the holding voltage of the DG-DDSCR and failure current derived from the test results of a transmission line pulse (TLP) are 29.4 V and 16.7 A, respectively. When the clamping voltage was 40 V, the transient current release of the structure can reach 11.61 A, which met the specifications of the CAN bus ESD window and was suitable for the ESD protection of the target application.

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Chinese Journal of Electrical Engineering
Pages 116-125

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Cite this article:
Bao X, Wang Y, Liu Y, et al. Design and Manufacture of Dual-gate DDSCR with High Failure Current and Holding Voltage. Chinese Journal of Electrical Engineering, 2024, 10(2): 116-125. https://doi.org/10.23919/CJEE.2024.000061

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Received: 22 August 2023
Revised: 25 October 2023
Accepted: 28 December 2023
Published: 30 June 2024
© 2024 China Machinery Industry Information Institute