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Publishing Language: Chinese | Open Access

Measurement of the Melting Point of Hexagonal Boron Nitride under Pressures below 5 GPa

Ruike ZHANG, Rui’ang GUO, Xiong XIAO, Duanwei HE( )
Institute of Atomic and Molecular Physics, Sichuan University, Chengdu 610065, Sichuan, China
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Abstract

In this study, a flash-heating device was designed and assembled to achieve instantaneous discharge heating of samples under high pressure in the DS 6×14 MN domestic hinged six-anvil large chamber press. By combining large chamber static high pressure and instantaneous discharge heating technologies, the melting state of crystals has been determined by the nucleation and growth characteristics during solidification. The melting behavior of h-BN powder crystal under high pressure was studied by instantaneous discharge heating treatment. Using scanning electron microscopy (SEM), the microstructures of samples obtained by high-pressure instantaneous discharge heating treatment was analyzed in order to assess the melting state of h-BN crystals. It was determined that the melting points of h-BN under 3.4 and 4.3 GPa are (4251±150) K and (4531±200) K, respectively. These results are beneficial for exploring the applications of h-BN and revising the existed temperature-pressure phase diagram of boron nitride.

CLC number: O521.3; O521.2 Document code: A

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Chinese Journal of High Pressure Physics

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Cite this article:
ZHANG R, GUO R, XIAO X, et al. Measurement of the Melting Point of Hexagonal Boron Nitride under Pressures below 5 GPa. Chinese Journal of High Pressure Physics, 2024, 38(6). https://doi.org/10.11858/gywlxb.20240813

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Received: 17 May 2024
Revised: 31 May 2024
Published: 05 December 2024
© 2024 Editorial Office of Chinese Journal of High Pressure Physics

This is an open access article under the CC BY-NC-ND license (https://creativecommons.org/licenses/by-nc/4.0/)