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Research Highlight | Open Access

Metalens-based 3D nanolithography breaks the throughput barrier

Xuhao Fan1,2,4 , Shih-Chi Chen2 ( ), Wei Xiong1,3 ( )
Wuhan National Laboratory for Optoelectronics and School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074, People’s Republic of China
Department of Mechanical and Automation Engineering, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong Special Administrative Region of China, People’s Republic of China
Optics Valley Laboratory, Wuhan 430074, People’s Republic of China
Centre for Perceptual and Interactive Intelligence (CPII), Hong Kong Science Park, Shatin, N.T., Hong Kong Special Administrative Region of China, People’s Republic of China
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International Journal of Extreme Manufacturing
Volume 8 Issue 4,
August 2026
DOI: 10.1088/2631-7990/ae614a

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Cite this article:
Fan X, Chen S-C, Xiong W. Metalens-based 3D nanolithography breaks the throughput barrier. International Journal of Extreme Manufacturing, 2026, 8(4). https://doi.org/10.1088/2631-7990/ae614a

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Received: 11 February 2026
Revised: 23 March 2026
Accepted: 17 April 2026
Published: 26 May 2026
© 2026 The Author(s).

Original content from this work may be used under the terms of the Creative Commons Attribution 4.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.