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Paper | Open Access

3D nanoscale fabrication and imaging: a multimodal approach for in situ and super-resolution characterization

Qiulan Liu1,2,§ Jisen Wen1,2,§Liang Xu1Zhenyao Yang1,3Chun Cao1,4Shangting You1 Gangyao Zhan3Yiwei Qiu5Wenjie Liu1,2Xiaobing Wang6Cuifang Kuang1( )Dazhao Zhu1,7( )Shih-Chi Chen8( )Xu Liu1( )
State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, People’s Republic of China
Frontier Fundamental Research Center, Zhejiang Lab, Hangzhou 311121, People’s Republic of China
Research Center for Computing Sensing, Zhejiang Lab, Hangzhou 311121, People’s Republic of China
School of Mechanical Engineering, Hangzhou Dianzi University, Hangzhou 310018, People’s Republic of China
Nanofabrication Center, Zhejiang Lab, Hangzhou 311121, People’s Republic of China
Research center of new materials computing, Zhejiang Lab, Hangzhou 311121, People’s Republic of China
Yuzhiquan Instrument Co., Ltd., Hangzhou 310000, People’s Republic of China
Department of Mechanical and Automation Engineering, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong SAR, People’s Republic of China

§ These authors contribute equally to this work.

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Abstract

The synergistic innovation of nanoscale optical fabrication and characterization technologies holds the key to overcoming three-dimensional (3D) precision manufacturing bottlenecks. This study reports the novel self-reporting functionality of 7-diethylamino-3-thenoylcoumarin (DETC) in photoresist, which serves as both a super-resolution photoinitiator and an intrinsic fluorophore with stimulated emission depletion (STED) behavior and polymerization-dependent lifetime characteristics. Through the development of an integrated system combining STED-inspired periphery photoinhibition (PPI) printing with dual-mode imaging, we achieve simultaneous in situ characterization and super-resolution quality verification. Specifically, PPI imaging demonstrates 50-nm lateral resolution for 40-nm printed lines and resolves 200-nm axial gaps when characterizing developed structures. Furthermore, in situ fluorescence lifetime imaging (FLIM) achieves nanometer-level resolution, comparable to confocal microscopy, by utilizing DETC’s lifetime shift to characterize undeveloped structures. This synergy imaging approach resolves the trade-off between resolution and non-destructive detection, while establishing a new paradigm for closed-loop optimization of complex 3D nanodevices, with profound implications for nanophotonics, precision biosensing, and ultrahigh-density optical storage.

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International Journal of Extreme Manufacturing

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Cite this article:
Liu Q, Wen J, Xu L, et al. 3D nanoscale fabrication and imaging: a multimodal approach for in situ and super-resolution characterization. International Journal of Extreme Manufacturing, 2026, 8(2). https://doi.org/10.1088/2631-7990/ae289e

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Received: 24 April 2025
Revised: 19 July 2025
Accepted: 05 December 2025
Published: 22 December 2025
© 2025 The Author(s).

Original content from this work may be used under the terms of the Creative Commons Attribution 4.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.