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Topical Review | Open Access

Helium-ion-beam nanofabrication: extreme processes and applications

Shixuan He1,2, Rong Tian1, Wei Wu3, Wen-Di Li4, Deqiang Wang1 
Chongqing Key Laboratory of Multi-scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714, People’s Republic of China
College of Physics, Sichuan University, Chengdu, Sichuan 610065, People’s Republic of China
Department of Electrical Engineering, University of Southern California, Los Angeles, CA 90089, United States of America
Department of Mechanical Engineering, The University of Hong Kong, Pokfulam, Hong Kong, People’s Republic of China
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Abstract

Helium ion beam (HIB) technology plays an important role in the extreme fields of nanofabrication. This paper reviews the latest developments in HIB technology as well as its extreme processing capabilities and widespread applications in nanofabrication. HIB-based nanofabrication includes direct-write milling, ion beam- induced deposition, and direct-write lithography without resist assistance. HIB nanoscale applications have also been evaluated in the areas of integrated circuits, materials sciences, nano-optics, and biological sciences. This review covers four thematic applications of HIB: (1) helium ion microscopy imaging for biological samples and semiconductors; (2) HIB milling and swelling for 2D/3D nanopore fabrication; (3) HIB-induced deposition for nanopillars, nanowires, and 3D nanostructures; (4) additional HIB direct writing for resist, graphene, and plasmonic nanostructures. This paper concludes with a summary of potential future applications and areas of improvement for HIB extreme nanofabrication technology.

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International Journal of Extreme Manufacturing
Pages 012001-012001

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Cite this article:
He S, Tian R, Wu W, et al. Helium-ion-beam nanofabrication: extreme processes and applications. International Journal of Extreme Manufacturing, 2021, 3(1): 012001. https://doi.org/10.1088/2631-7990/abc673

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Received: 10 May 2020
Revised: 24 June 2020
Accepted: 30 October 2020
Published: 23 November 2020
© 2020 The Author(s).

Original content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.