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Open Access

Fatigue of metals at nanoscale: Metal thin films and conductive interconnects for flexible device application

XueMei LuoaBin ZhangbGuangPing Zhanga( )
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang, 110016, PR China
Key Laboratory for Anisotropy and Texture of Materials, Ministry of Education, School of Materials Science and Engineering, Northeastern University, 3-11 Wenhua Road, Shenyang, 110819, PR China
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Abstract

As electrodes and electrical interconnects in flexible electronic devices, metal films are one of the weakest components in the system against mechanical deformation in daily use. Fatigue reliability at nanoscale becomes a practical concern for these flexible electronic devices. This review introduces state-of-the-art fatigue testing techniques and evaluation methods for thin metal films and conductive interconnect materials constrained by a substrate. Then, experimental results about fatigue damage behaviors, fatigue properties and fatigue life prediction are summarized. Furthermore, fundamental insights into fatigue mechanisms of metals at the nanoscale and the size effects on fatigue properties are elucidated. Finally, the perspectives of studies on fatigue of thin metal films constrained by a substrate are proposed.

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Nano Materials Science
Pages 198-207

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Cite this article:
Luo X, Zhang B, Zhang G. Fatigue of metals at nanoscale: Metal thin films and conductive interconnects for flexible device application. Nano Materials Science, 2019, 1(3): 198-207. https://doi.org/10.1016/j.nanoms.2019.02.003

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Received: 16 November 2018
Accepted: 18 December 2018
Published: 21 March 2019
© 2019 Chongqing University. Production and hosting by Elsevier B.V. on behalf of KeAi.

This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/).