AI Chat Paper
Note: Please note that the following content is generated by AMiner AI. SciOpen does not take any responsibility related to this content.
{{lang === 'zh_CN' ? '文章概述' : 'Summary'}}
{{lang === 'en_US' ? '中' : 'Eng'}}
Chat more with AI
PDF (340.5 KB)
Collect
Submit Manuscript AI Chat Paper
Show Outline
Outline
Show full outline
Hide outline
Outline
Show full outline
Hide outline

Estimates of EEPROM Device Lifetime

Leilei LI1,2Zongguang YU1,2( )Yue HAO1
School of Microelectronics, Xidian University, Xi’an, 710071, China
58th Research Institute, China Electronics Technology Group Corporation, Wuxi 214035, China
Show Author Information

Abstract

A method was developed to estimate EEPROM device life based on the consistency for breakdown charge, QBD, for constant voltage time dependent dielectric breakdown (TDDB) and constant current TDDB stress tests. Although an EEPROM works with a constant voltage, QBD for the tunnel oxide can be extracted using a constant current TDDB. Once the charge through the tunnel oxide, ΔQFG, is measured, the lower limit of the EEPROM life can be related to QBDQFG. The method is reached by erase/write cycle tests on an EEPROM.

References

【1】
【1】
 
 
Tsinghua Science and Technology
Pages 170-174

{{item.num}}

Comments on this article

Go to comment

< Back to all reports

Review Status: {{reviewData.commendedNum}} Commended , {{reviewData.revisionRequiredNum}} Revision Required , {{reviewData.notCommendedNum}} Not Commended Under Peer Review

Review Comment

Close
Close
Cite this article:
LI L, YU Z, HAO Y. Estimates of EEPROM Device Lifetime. Tsinghua Science and Technology, 2011, 16(2): 170-174. https://doi.org/10.1016/S1007-0214(11)70026-8

10

Views

0

Downloads

0

Crossref

N/A

Web of Science

0

Scopus

7

CSCD

Received: 26 January 2011
Revised: 28 February 2011
Published: 01 April 2011
© Tsinghua University Press 2011