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Performance and Reliability of Multilayer Silicon Nanocrystal Nonvolatile Memory

Liudi WANGZhigang ZHANG( )Yue ZHAOPing MAOLiyang PAN
Tsinghua National Laboratory for Information Science and Technology (TNList), Institute of Microelectronics, Tsinghua University, Beijing 100084, China
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Abstract

Nonvolatile memories (NVMs) with triple layers of silicon nanocrystals were fabricated with conventional CMOS technology. This paper explores the program/erase performance and reliability of NVMs with three layers of nanocrystals. The results indicate that the nanocrystals in the triple-layer nanocrystal NVM (NCNVM) are difficult to fully charge during the programming process. The programming speed of the triple-layer NCNVMs is quicker than that of single-layer NCNVMs, which means that the second and third layers of nanocrystals in the triple-layer NCNVM affect the charge of the first layer nanocrystals. Reliability tests show that the memory window has little degradation after 1×104 cycles.

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Tsinghua Science and Technology
Pages 103-105

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Cite this article:
WANG L, ZHANG Z, ZHAO Y, et al. Performance and Reliability of Multilayer Silicon Nanocrystal Nonvolatile Memory. Tsinghua Science and Technology, 2009, 14(1): 103-105. https://doi.org/10.1016/S1007-0214(09)70014-8

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Received: 26 March 2008
Revised: 12 October 2008
Published: 01 February 2009
© Tsinghua University Press 2009