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Research Article | Open Access

Insight into the high-temperature tribological mechanism of VAlTiCrW high entropy alloy film: AlV3O9 from tribochemistry

Xuesong LIU1,2, Jun FAN2, Jibin PU2( ), Zhaoxia LU1( )
College of Chemistry and Chemical Engineering, Guangxi University, Nanning 530004, China
Key Laboratory of Marine Materials and Related Technologies, Key Laboratory of Marine Materials and Protective Technologies of Zhejiang Province, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
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Abstract

High-entropy alloys have made significant progress in high mechanical properties, wear resistance, and corrosion resistance properties. Excellent tribological properties, especially high-temperature lubrication, have become another sought performance. In this work, VAlTiCrW high-entropy alloy film with body-centered cubic (BCC) structure was prepared on superalloy substrate by magnetron sputtering. It is found that the VAlTiCrW film shows very low friction coefficient of 0.15 and a low wear rate of 10-5 orders of magnitude at 800 °C. After 800 °C oxidation, the film can still obtain a friction coefficient of no more than 0.2 at 700 °C. XRD and TEM revealed the formation of ternary oxide AlV3O9 with preferred orientation of (002) crystal plane with large spacing of 0.71 nm on the wear surface of the film, a high-temperature lubricating phase that has not been reported, realizes the low friction coefficient. This AlV3O9 can be formed by tribochemical reaction under the thermal-mechanical action at 700 °C, but pre-oxidation at 800 °C is the prerequisite in order to form the precursors of V-rich and Al-rich oxide layer.

Keywords

oxidehigh entropy alloyhigh temperature frictionAlV3O9

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Friction
Volume 11 Issue 7,
July 2023
Pages 1165-1176
DOI: 10.1007/s40544-022-0640-7
Cite this article:
LIU X, FAN J, PU J, et al. Insight into the high-temperature tribological mechanism of VAlTiCrW high entropy alloy film: AlV3O9 from tribochemistry. Friction, 2023, 11(7): 1165-1176. https://doi.org/10.1007/s40544-022-0640-7

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Received: 11 February 2022
Revised: 21 March 2022
Accepted: 21 April 2022
Published: 08 September 2022
© The author(s) 2022.

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