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Research Article | Open Access

Novel three-body nano-abrasive wear mechanism

Ruling CHEN( )Shaoxian LI
College of Mechanical Engineering, Donghua University, Shanghai 201620, China
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Abstract

Current three-body abrasive wear theories are based on a macroscale abrasive indentation process, and these theories claim that material wear cannot be achieved without damaging the hard mating surface. In this study, the process of three-body nano-abrasive wear of a system including a single crystalline silicon substrate, an amorphous silica cluster, and a polyurethane pad, based on a chemical mechanical polishing (CMP) process, is investigated via molecular dynamics simulations. The cluster slid in a suspended state in smooth regions and underwent rolling impact in the asperity regions of the silicon surface, realizing non-damaging monoatomic material removal. This proves that indentation-plowing is not necessary when performing CMP material removal. Therefore, a non-indentation rolling-sliding adhesion theory for three-body nano-abrasive wear between ultrasoft/hard mating surfaces is proposed. This wear theory not only unifies current mainstream CMP material removal theories, but also clarifies that monoatomic material wear without damage can be realized when the indentation depth is less than zero, thereby perfecting the relationship between material wear and surface damage. These results provide new understanding regarding the CMP microscopic material removal mechanism as well as new research avenues for three-body abrasive wear theory at the monoatomic scale.

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Friction
Pages 677-687
Cite this article:
CHEN R, LI S. Novel three-body nano-abrasive wear mechanism. Friction, 2022, 10(5): 677-687. https://doi.org/10.1007/s40544-020-0481-1

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Received: 01 July 2020
Revised: 07 October 2020
Accepted: 07 December 2020
Published: 27 February 2021
© The author(s) 2020.

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