Effect of processing parameters on in situ screen printing-assisted synthesis and electrical properties of Ti3SiC2-based structures

Mylena LORENZ; Nahum TRAVITZKY; Carlos R. RAMBO

doi:10.1007/s40145-020-0427-0

Journal of Advanced Ceramics 2021, 10(1): 129-138 https://doi.org/10.1007/s40145-020-0427-0

Research Article |

Open Access | Issue | Published: 18 January 2021

Effect of processing parameters on in situ screen printing-assisted synthesis and electrical properties of Ti₃SiC₂-based structures

Show Author's Information Hide Author's Information Mylena LORENZ^{^a}, Nahum TRAVITZKY^{^a^,^b}, Carlos R. RAMBO^{^c}(

)

aDepartment of Materials Science, University of Erlangen-Nuremberg, 91058 Erlangen, Germany

bTomsk Polytechnic University, 634050 Tomsk, Russia

cDepartment of Electrical and Electronic Engineering, Federal University of Santa Catarina, 88040-900 Florianopolis, Brazil

Keywords:

electrical conductivity, MAX phases, Ti₃SiC₂, screen printing, in situ synthesis

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LORENZ M, TRAVITZKY N, RAMBO CR. Effect of processing parameters on in situ screen printing-assisted synthesis and electrical properties of Ti₃SiC₂-based structures. Journal of Advanced Ceramics, 2021, 10(1): 129-138. https://doi.org/10.1007/s40145-020-0427-0

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Abstract

This work reports on the development of pastes containing Ti, TiC, Si, and C elementary powders for in situ synthesis of Ti₃SiC₂ via screen printing. Four paste compositions were manufactured using two powder mixtures (Ti/Si/C and Ti/TiC/Si/C) with different stoichiometry. The pastes were screen printed onto Al₂O₃ substrates and sintered at 1400 ℃ in argon varying the dwell time from 1 to 5 h. The printed pastes containing TiC and excess of Si exhibited the lowest surface roughness and after 5 h sintering comprised of Ti₃SiC₂ as the majority phase. The electrical conductivity of this sample was found to range from 4.63×10⁴ to 2.57×10⁵ S·m^-1 in a temperature range of 25-400 ℃.

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Effect of processing parameters on in situ screen printing-assisted synthesis and electrical properties of Ti₃SiC₂-based structures

Show Author's information Hide Author's Information Mylena LORENZ^{^a}, Nahum TRAVITZKY^{^a^,^b}, Carlos R. RAMBO^{^c}(

)

aDepartment of Materials Science, University of Erlangen-Nuremberg, 91058 Erlangen, Germany

bTomsk Polytechnic University, 634050 Tomsk, Russia

cDepartment of Electrical and Electronic Engineering, Federal University of Santa Catarina, 88040-900 Florianopolis, Brazil

Abstract

Keywords: electrical conductivity, MAX phases, Ti₃SiC₂, screen printing, in situ synthesis

References(42)

[1]

MW Barsoum, T El-Raghy. Synthesis and characterization of a remarkable ceramic: Ti₃SiC₂. J Am Ceram Soc 1996, 79: 1953-1956.

DOI Google Scholar

[2]

T El-Raghy, MW Barsoum. Diffusion kinetics of the carburization and silicidation of Ti₃SiC₂. J Appl Phys 1998, 83: 112-119.

DOI Google Scholar

[3]

T El-Raghy, MW Barsoum. Processing and mechanical properties of Ti₃SiC₂: I, reaction path and microstructure evolution. J Am Ceram Soc 1999, 82: 2849-2854.

DOI Google Scholar

[4]

J Emmerlich, D Music, P Eklund, et al. Thermal stability of Ti₃SiC₂ thin films. Acta Mater 2007, 55: 1479-1488.

DOI Google Scholar

[5]

ZM Sun, YC Zhou. Fluctuation synthesis and characterization of Ti₃SiC₂ powders. Mater Res Innov 1999, 2: 227-231.

DOI Google Scholar

[6]

Y Zhou, Z Sun. Temperature fluctuation/hot pressing synthesis of Ti₃SiC₂. J Mater Sci 2000, 35: 4343-4346.

DOI Google Scholar

[7]

NF Gao, Y Miyamoto, D Zhang. Dense Ti₃SiC₂ prepared by reactive HIP. J Mater Sci 1999, 34: 4385-4392.

DOI Google Scholar

[8]

N Gao, J Li, D Zhang, et al. Rapid synthesis of dense Ti₃SiC₂ by spark plasma sintering. J Eur Ceram Soc 2002, 22: 2365-2370.

DOI Google Scholar

[9]

MMM Carrijo, LG Caro, H Lorenz, et al. Ti₃SiC₂-based inks for direct ink-jet printing technology. Ceram Int 2017, 43: 820-824.

DOI Google Scholar

[10]

J Schultheiß, B Dermeik, I Filbert-Demut, et al. Processing and characterization of paper-derived Ti₃SiC₂ based ceramic. Ceram Int 2015, 41: 12595-12603.

DOI Google Scholar

[11]

J Emmerlich, H Högberg, S Sasvári, et al. Growth of Ti₃SiC₂ thin films by elemental target magnetron sputtering. J Appl Phys 2004, 96: 4817-4826.

DOI Google Scholar

[12]

MMM Carrijo, H Lorenz, I Filbert-Demut, et al. Fabrication of Ti₃SiC₂-based composites via three-dimensional printing: Influence of processing on the final properties. Ceram Int 2016, 42: 9557-9564.

DOI Google Scholar

[13]

SB Li, HX Zhai. Synthesis and reaction mechanism of Ti₃SiC₂ by mechanical alloying of elemental Ti, Si, and C powders. J Am Ceram Soc 2005, 88: 2092-2098.

DOI Google Scholar

[14]

D Dcosta, W Sun, F Lin, et al. Freeform fabrication of Ti₃SiC₂ powder-based structures. J Mater Process Technol 2002, 127: 352-360.

DOI Google Scholar

[15]

R Faddoul, N Reverdy-Bruas, A Blayo. Formulation and screen printing of water based conductive flake silver pastes onto green ceramic tapes for electronic applications. Mat Sci Eng B 2012, 177: 1053-1066.

DOI Google Scholar

[16]

JW Phair, M Lundberg, A Kaiser. Leveling and thixotropic characteristics of concentrated zirconia inks for screen printing. Rheol Acta 2009, 48: 121-133.

DOI Google Scholar

[17]

HW Lin, CP Chang, WH Hwu, et al. The rheological behaviors of screen-printing pastes. J Mater Process Technol 2008, 197: 284-291.

DOI Google Scholar

[18]

HD Goldberg, RB Brown, DP Liu, et al. Screen printing: A technology for the batch fabrication of integrated chemical-sensor arrays. Sensor Actuat B: Chem 1994, 21: 171-183.

DOI Google Scholar

[19]

JW Phair. Rheological analysis of concentrated zirconia pastes with ethyl cellulose for screen printing SOFC electrolyte films. J Am Ceram Soc 2008, 91: 2130-2137.

DOI Google Scholar

[20]

MMM Carrijo, H Lorenz, CR Rambo, et al. Fabrication of Ti₃SiC₂-based pastes for screen printing on paper-derived Al₂O₃ substrates. Ceram Int 2018, 44: 8116-8124.

DOI Google Scholar

[21]

QF Zan, CA Wang, Y Huang, et al. The interface-layer and interface in the Al₂O₃/Ti₃SiC₂ multilayer composites prepared by in situ synthesis. Mater Lett 2003, 57: 3826-3832.

DOI Google Scholar

[22]

C Kluthe, B Dermeik, W Kollenberg, et al. Processing, microstructure and properties of paper-derived porous Al₂O₃ substrates. J Ceram Sci Technol 2012, 3: 111-118.

Google Scholar

[23]

K Inukai, Y Takahashi, K Ri, et al. Rheological analysis of ceramic pastes with ethyl cellulose for screen-printing. Ceram Int 2015, 41: 5959-5966.

DOI Google Scholar

[24]

A Méndez-Vilas, J Díaz. Modern Research and Educational Topics in Microscopy. Badajoz, Spain: Formatex, 2007.

[25]

DIN EN ISO 4287: 2010-07. Geometrical Product Specifications (GPS) - Surface texture: Profile method - Terms, definitions and surface texture parameters (ISO 4287:1997 + Cor 1:1998 + Cor 2:2005 + Amd 1:2009); German version EN ISO 4287:1998 + AC:2008 + A1:2009. 2010.

[26]

S Murakami, K Ri, T Itoh, et al. Effects of ethyl cellulose polymers on rheological properties of (La,Sr)(Ti,Fe)O₃-terpineol pastes for screen printing. Ceram Int 2014, 40: 1661-1666.

DOI Google Scholar

[27]

M Sedlaček, B Podgornik, J Vižintin. Influence of surface preparation on roughness parameters, friction and wear. Wear 2009, 266: 482-487.

DOI Google Scholar

[28]

F Sato, JF Li, R Watanabe. Reaction synthesis of Ti₃SiC₂ from mixture of elemental powders. Mater Trans, JIM 2000, 41: 605-608.

DOI Google Scholar

[29]

C Racault, F Langlais, R Naslain. Solid-state synthesis and characterization of the ternary phase Ti₃SiC₂. J Mater Sci 1994, 29: 3384-3392.

DOI Google Scholar

[30]

S Arunajatesan, AH Carim. Synthesis of titanium silicon carbide. J Am Ceram Soc 1995, 78: 667-672.

DOI Google Scholar

[31]

V Gauthier, B Cochepin, S Dubois, et al. Self-propagating high-temperature synthesis of Ti₃SiC₂: Study of the reaction mechanisms by time-resolved X-ray diffraction and infrared thermography. J Am Ceram Soc 2006, 89: 2899-2907.

DOI Google Scholar

[32]

JY Wu, YC Zhou, JY Wang, et al. Interfacial reaction between Cu and Ti₂SnC during processing of Cu-Ti₂SnC composite. Zeitschrift Für Met 2005, 96: 1314-1320.

DOI Google Scholar

[33]

SL Yang, ZM Sun, H Hashimoto. Reaction in Ti₃SiC₂ powder synthesis from a Ti-Si-TiC powder mixture. J Alloys Compd 2004, 368: 312-317.

DOI Google Scholar

[34]

H Klemm, K Tanihata, Y Miyamoto. Gas pressure combustion sintering and hot isostatic pressing in the Ti-Si-C system. J Mater Sci 1993, 28: 1557-1562.

DOI Google Scholar

[35]

HB Zhang, YC Zhou, YW Bao, et al. Intermediate phases in synthesis of Ti₃SiC₂ and Ti₃Si(Al)C₂ solid solutions from elemental powders. J Eur Ceram Soc 2006, 26: 2373-2380.

DOI Google Scholar

[36]

CS Park, F Zheng, S Salamone, et al. Processing of composites in the Ti-Si-C system. J Mater Sci 2001, 36: 3313-3322.

DOI Google Scholar

[37]

H Lorenz, J Thäter, MM Matias Carrijo, et al. In situ synthesis of paper-derived Ti₃SiC₂. J Mater Res 2017, 32: 3409-3414.

DOI Google Scholar

[38]

R Radhakrishnan, J Williams, M Akinc. Synthesis and high-temperature stability of Ti₃SiC₂. J Alloys Compd 1999, 285: 85-88.

DOI Google Scholar

[39]

HI Yoo, MW Barsoum, T El-Raghy. Ti₃SiC₂ has negligible thermopower. Nature 2000, 407: 581-582.

DOI Google Scholar

[40]

J-P Palmquist, S Li, POÅ Persson, et al. M_n+1AX_n phases in the Ti-Si-C system studied by thin-film synthesis and ab initio calculations. Phys Rev B 2004, 70: 165401.

DOI Google Scholar

[41]

KM Gupta, N Gupta. Advanced Electrical and Electronics Materials. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2015.

DOI

[42]

XH Wang, YC Zhou. Improvement of intermediate-temperature oxidation resistance of Ti₃AlC₂ by pre-oxidation at high temperatures. Mater Res Innov 2003, 7: 205-211.

DOI Google Scholar

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Acknowledgements

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Publication history

Received: 12 July 2020

Revised: 17 September 2020

Accepted: 26 September 2020

Published: 18 January 2021

Issue date: February 2021

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Acknowledgements

The authors thank the Central Laboratory of Electronic Microscopy (LCME-UFSC) and the multiuser facility LDRX at UFSC. This study was financed in part by the Coordenação de Aperfeiçoamento de Pessoal de Nível Superior - Brazil (CAPES) - Finance Code 001, under Project number 88881.310728/2018-01 and by the National Council for Scientific and Technological Development (CNPq-Brazil), Project number PVE-CNPq-407102/2013-2.

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