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Research Article | Open Access

Preparation of rutile TiO2 thin films by laser chemical vapor deposition method

Dongyun GUOa,b,*( ), Akihiko ITOb, Takashi GOTOb, Rong TUb, Chuanbin WANGa, Qiang SHENa, Lianmeng ZHANGa
State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, and School of Materials Science and Engineering, Wuhan University of Technology, Wuhan 430070, China
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
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Abstract

TiO2 thin films were prepared on Pt/Ti/SiO2/Si substrate by laser chemical vapor deposition (LCVD) method. The effects of laser power (PL) and total pressure (ptot) on the microstructure of TiO2 thin films were investigated. The deposition temperature (Tdep) was mainly affected by PL, increasing with PL increasing. The single-phase rutile TiO2 thin films with different morphologies were obtained. The morphologies of TiO2 thin films were classified into three typical types, including the powdery, Wulff-shaped and granular microstructures. ptot and Tdep were the two critical factors that could be effectively used for controlling the morphology of the films.

Keywords

microstructurelaser powerrutile TiO2 thin filmlaser chemical vapor deposition (LCVD)total pressure

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Journal of Advanced Ceramics
Volume 2 Issue 2,
June 2013
Pages 162-166
DOI: 10.1007/s40145-013-0056-y
Cite this article:
GUO D, ITO A, GOTO T, et al. Preparation of rutile TiO2 thin films by laser chemical vapor deposition method. Journal of Advanced Ceramics, 2013, 2(2): 162-166. https://doi.org/10.1007/s40145-013-0056-y

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Received: 13 January 2013
Revised: 16 March 2013
Accepted: 18 March 2013
Published: 04 June 2013
© The author(s) 2013

Open Access: This article is distributed under the terms of the Creative Commons Attribution Noncommercial License which permits any noncommercial use, distribution, and reproduction in any medium, provided the original author(s) and source are credited.
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