Theoretical investigations on the growth of graphene by oxygen-assisted chemical vapor deposition

Recently, graphene has drawn considerable attention in the field of electronics, owing to its favorable conductivity and high carrier mobility. Crucial to the industrialization of graphene is its high-quality microfabrication via chemical vapor deposition. However, many problems remain in its preparation, such as the not fully understood cracking mechanism of the carbon source, the mechanism of its substrate oxidation, and insufficient defect repair theory. To help close this capability gap, this study leverages density functional theory to explore the role of O in graphene growth. The effects of Cu substrate oxidation on carbon source cracking, nucleation barriers, crystal nucleus growth, and defect repairs are discussed. O_Cu was found to reduce energy change during dehydrogenation, rendering the process easier. Moreover, the adsorbed O in graphene or its Cu substrate can promote defect repair and edge growth.