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Nano Research 2023, 16(2): 3603 https://doi.org/10.1007/s12274-022-5088-6
Erratum | Issue | Published: 30 September 2022

Erratum to: Grain boundary boosting the thermal stability of Pt/CeO2 thin films

Show Author's Information Luyao Wang1,  Xiaobao Li2,  Xiangchen Hu3,  Shuyue Chen3,  Zhehao Qiu3,  Yifan Wang1,  Hui Zhang2,  Yi Yu3,  Bo Yang3,  Yong Yang3,  Pasquale Orgiani4,  Carmela Aruta5( ),  Nan Yang1( )
Electrochemical thin film group, School of physical science and technology, ShanghaiTech University, Shanghai 201210, China
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
School of physical science and technology, ShanghaiTech University, Shanghai 201210, China
CNR-IOM, TASC National Laboratory, I-34149 Trieste, Italy
CNR-SPIN, UOS Roma, Area della Ricerca di Tor Vergata, Rome I-00133, Italy
Keywords:
grain boundaries, defect engineering, pulsed laser deposition, platinum doped cerium oxide (Pt/CeO2), epitaxial thin films, in-situ ambient-pressure X-ray photoemission spectroscopy
The online version of the original article can be found at https://doi.org/10.1007/s12274-022-4899-9
Cite this article:
Wang L, Li X, Hu X, et al. Erratum to: Grain boundary boosting the thermal stability of Pt/CeO2 thin films. Nano Research, 2023, 16(2): 3603. https://doi.org/10.1007/s12274-022-5088-6
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Erratum to: Grain boundary boosting the thermal stability of Pt/CeO2 thin films

Show Author's information Luyao Wang1, Xiaobao Li2, Xiangchen Hu3, Shuyue Chen3, Zhehao Qiu3, Yifan Wang1, Hui Zhang2, Yi Yu3, Bo Yang3, Yong Yang3, Pasquale Orgiani4, Carmela Aruta5( ), Nan Yang1( )
Electrochemical thin film group, School of physical science and technology, ShanghaiTech University, Shanghai 201210, China
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
School of physical science and technology, ShanghaiTech University, Shanghai 201210, China
CNR-IOM, TASC National Laboratory, I-34149 Trieste, Italy
CNR-SPIN, UOS Roma, Area della Ricerca di Tor Vergata, Rome I-00133, Italy
Keywords: grain boundaries, defect engineering, pulsed laser deposition, platinum doped cerium oxide (Pt/CeO2), epitaxial thin films, in-situ ambient-pressure X-ray photoemission spectroscopy
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Published: 30 September 2022
Issue date: February 2023

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