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Graphene nanoribbons (GNRs) are regarded as an ideal candidate for beyond-silicon electronics. However, synthesis of aligned GNR arrays on insulating substrates with high efficiency is challenging. In this work, we develop a facile strategy, involving KOH pre-treatment and high-temperature annealing, to construct parallel steps on the two-fold symmetry a-plane sapphire substrate. Horizontal GNRs as narrow as 15.1 nm with global alignment across a region of 20 mm2 are then grown on the step edge-enriched substrate through plasma enhanced chemical vapor deposition (PECVD) method. GNRs align well along the atomic steps on sapphire ([
Graphene nanoribbons (GNRs) are regarded as an ideal candidate for beyond-silicon electronics. However, synthesis of aligned GNR arrays on insulating substrates with high efficiency is challenging. In this work, we develop a facile strategy, involving KOH pre-treatment and high-temperature annealing, to construct parallel steps on the two-fold symmetry a-plane sapphire substrate. Horizontal GNRs as narrow as 15.1 nm with global alignment across a region of 20 mm2 are then grown on the step edge-enriched substrate through plasma enhanced chemical vapor deposition (PECVD) method. GNRs align well along the atomic steps on sapphire ([
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This work was financially supported by the Ministry of Science and Technology of China (Nos. 2016YFA0200100 and 2018YFA0703502), the National Natural Science Foundation of China (Nos. 52021006, 51720105003, 21790052, and 21974004), the Strategic Priority Research Program of Chinese Academy of Sciences (No. XDB36030100), and the Beijing National Laboratory for Molecular Sciences (No. BNLMS-CXTD-202001).