Erratum to: Multi-stage anisotropic etching of two-dimensional heterostructures

Lin Li; Jichen Dong; Dechao Geng; Menghan Li; Wei Fu; Feng Ding; Wenping Hu; Hui Ying Yang

doi:10.1007/s12274-022-4387-2

Nano Research 2022, 15(7): 6790-6791 https://doi.org/10.1007/s12274-022-4387-2

Erratum | Issue | Published: 28 April 2022

Erratum to: Multi-stage anisotropic etching of two-dimensional heterostructures

Show Author's Information Hide Author's Information Lin Li^¹, Jichen Dong^², Dechao Geng^{³^,⁴}(

), Menghan Li^¹, Wei Fu^⁵, Feng Ding^⁴, Wenping Hu^⁴, Hui Ying Yang^³(

)

1 Institute of Molecular Plus, Tianjin University, Tianjin 300072, China

2 Centre for Multidimensional Carbon Materials, Institute for Basic Science, Ulsan 44919, Republic of Korea

3 Pillar of Engineering Product Development, Singapore University of Technology and Design, Singapore 487372, Singapore

4 Tianjin Key Laboratory of Molecular Optoelectronic Sciences, Department of Chemistry, School of Science, Tianjin University and Collaborative Innovation Center of Chemical Science and Engineering, Tianjin 300072, China

5 Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology, and Research (A* STAR), Singapore 138634, Singapore

Keywords:

two-dimensional materials, graphene, anisotropic etching, heterostructures, h-BN

The online version of the original article can be found at https://doi.org/10.1007/s12274-022-4193-x

Cite this article:

Li L, Dong J, Geng D, et al. Erratum to: Multi-stage anisotropic etching of two-dimensional heterostructures. Nano Research, 2022, 15(7): 6790-6791. https://doi.org/10.1007/s12274-022-4387-2