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Research Article

Self-assembly of colloidal polymers from two-patch silica nanoparticles

Weiya Li1,2, Bin Liu1,2, Céline Hubert1,3, Adeline Perro3, Etienne Duguet2, Serge Ravaine1( )
Univ. Bordeaux, CNRS, CRPP, UMR 5031, Pessac 33600, France
Univ. Bordeaux, CNRS, ICMCB, UMR 5026, Pessac 33600, France
Univ. Bordeaux, CNRS, Bordeaux INP, ISM, UMR 5255, Talence 33400, France
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Abstract

We report the formation of colloidal polymers consisting of disk-like silica nanoparticles (NPs) with polystyrene (PS) chains at the bottom of their two cavities assembled through reduction of the solvent quality for the PS chains and linked by hydrophobic associations. We show that this NPs assembly exhibits a two-stage process involving reaction-controlled polymerization and diffusion-controlled polymerization. Colloidal polymer networks are produced by the incorporation of three-patch NPs, which serve as branching points between the colloidal chains. By co-assembling preformed homopolymers composed of patchy NPs of different sizes or surface chemical groups, block copolymers are also achieved. This study provides insight into the process of self-assembly of two-patch NPs by precisely designing the components to generate colloidal analogues of linear macromolecular chains.

Keywords

self-assemblynanoparticlescolloidal polymerspatchy

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Nano Research
Volume 13 Issue 12,
December 2020
Pages 3371-3376
DOI: 10.1007/s12274-020-3024-1
Cite this article:
Li W, Liu B, Hubert C, et al. Self-assembly of colloidal polymers from two-patch silica nanoparticles. Nano Research, 2020, 13(12): 3371-3376. https://doi.org/10.1007/s12274-020-3024-1
Topics:
Block copolymers NanoparticlesSelf assemblySilicaSilica nanoparticlesSols

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Received: 03 January 2020
Revised: 31 July 2020
Accepted: 01 August 2020
Published: 09 September 2020
© Tsinghua University Press and Springer-Verlag GmbH Germany, part of Springer Nature
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