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Nano Research 2021, 14(6): 1598-1608 https://doi.org/10.1007/s12274-020-3019-y
Review Article | Issue | Published: 22 August 2020

Monolayer MoS2 epitaxy

Show Author's Information Zheng Wei1,2,  Qinqin Wang1,2,  Lu Li1,2,  Rong Yang1,2,3,  Guangyu Zhang1,2,3( )
Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
School of Physical Sciences, University of Chinese Academy of Sciences, Beijing 100190, China
Songshan Lake Materials Laboratory, Dongguan 523808, China
Keywords:
monolayer MoS2, heterostructures, epitaxy, domain size, domain alignment
Topics:
Energy storageLayered semiconductorsMolybdenum compoundsMonolayersSulfur compounds
Cite this article:
Wei Z, Wang Q, Li L, et al. Monolayer MoS2 epitaxy. Nano Research, 2021, 14(6): 1598-1608. https://doi.org/10.1007/s12274-020-3019-y
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Abstract Full text About this article

As an emerging two-dimensional (2D) semiconductor material, monolayer MoS2 has recently attracted considerable attention. Various promising applications of this material have been proposed for electronics, optoelectronics, sensing, catalysis, energy storage, and so on. To realize these practical applications, high-quality and large-area MoS2 with controllable properties is required. Among the many different synthesis techniques, epitaxy provides a promising route for producing MoS2 monolayers. Here, we review the epitaxial growth of monolayer MoS2 on various substrates, with a particular focus on large-scale films with large domain sizes and high domain alignments. Finally, we offer perspectives and challenges for future research and applications of this technology.


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About this article

Monolayer MoS2 epitaxy

Show Author's information Zheng Wei1,2, Qinqin Wang1,2, Lu Li1,2, Rong Yang1,2,3, Guangyu Zhang1,2,3( )
Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
School of Physical Sciences, University of Chinese Academy of Sciences, Beijing 100190, China
Songshan Lake Materials Laboratory, Dongguan 523808, China

Abstract

As an emerging two-dimensional (2D) semiconductor material, monolayer MoS2 has recently attracted considerable attention. Various promising applications of this material have been proposed for electronics, optoelectronics, sensing, catalysis, energy storage, and so on. To realize these practical applications, high-quality and large-area MoS2 with controllable properties is required. Among the many different synthesis techniques, epitaxy provides a promising route for producing MoS2 monolayers. Here, we review the epitaxial growth of monolayer MoS2 on various substrates, with a particular focus on large-scale films with large domain sizes and high domain alignments. Finally, we offer perspectives and challenges for future research and applications of this technology.

Keywords: monolayer MoS2, heterostructures, epitaxy, domain size, domain alignment

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Publication history
Copyright
Acknowledgements

Publication history

Received: 15 May 2020
Revised: 28 July 2020
Accepted: 29 July 2020
Published: 22 August 2020
Issue date: June 2021

Copyright

© Tsinghua University Press and Springer-Verlag GmbH Germany, part of Springer Nature

Acknowledgements

This work was supported by the National Natural Science Foundation of China (Nos. 11834017 and 61888102), the National Key Research and Development Program of China (No. 2016YFA0300904), the Key Research Program of Frontier Sciences of CAS (No. QYZDB-SSW-SLH004), and the Strategic Priority Research Program of CAS (Nos. XDB30302000 and XDB33010300).

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