Monolayer MoS₂ epitaxy

As an emerging two-dimensional (2D) semiconductor material, monolayer MoS₂ has recently attracted considerable attention. Various promising applications of this material have been proposed for electronics, optoelectronics, sensing, catalysis, energy storage, and so on. To realize these practical applications, high-quality and large-area MoS₂ with controllable properties is required. Among the many different synthesis techniques, epitaxy provides a promising route for producing MoS₂ monolayers. Here, we review the epitaxial growth of monolayer MoS₂ on various substrates, with a particular focus on large-scale films with large domain sizes and high domain alignments. Finally, we offer perspectives and challenges for future research and applications of this technology.