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Scalable synthesis of transfer-free graphene over insulators offers exciting opportunity for next-generation electronics and optoelectronics. However, rational design of synthetic protocols to harvest wafer-scale production of directly grown graphene still remains a daunting challenge. Herein we explore a batch synthesis of large-area graphene with wafer-scale uniformity by virtue of direct chemical vapor deposition (CVD) on quartz. Such a controllable CVD approach allows to synthesize 30 pieces of 4-inch graphene wafers in one batch, affording a low fluctuation of optical and electrical properties. Computational fluid dynamics simulations reveal the mechanism of uniform growth, indicating thermal field and confined flow field play leading roles in attaining the batch uniformity. The resulting wafer-scale graphene enables the direct utilization as key components in optical elements. Our method is applicable to other types of insulating substrates (e.g., sapphire, SiO2/Si, Si3N4), which may open a new avenue for direct manufacture of graphene wafers in an economic fashion.

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Publication history

Received: 19 September 2019
Revised: 04 March 2020
Accepted: 22 March 2020
Published: 07 April 2020
Issue date: June 2020

Copyright

© Tsinghua University Press and Springer-Verlag GmbH Germany, part of Springer Nature 2020

Acknowledgements

This work was financially supported by the National Basic Research Program of China (No. 2016YFA0200103), the National Natural Science Foundation of China (Nos. 61527814, 51702225, 51432002, 61474109, 51290272, 51502007, 11474274, and 51672007), the National Equipment Program of China (No. ZDYZ2015-1), Beijing Municipal Science and Technology Planning Project (Nos. Z181100004818002 and Z191100000819004), and Beijing Natural Science Foundation (No. 4182063).

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Email: nanores@tup.tsinghua.edu.cn

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