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13 November 2019
Angular dependence of nanoparticle generation in the matrix assembly cluster source
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The matrix assembly cluster source (MACS) represents a bridge between conventional instruments for cluster beam deposition (CBD) and the level of industrial production. The method is based on Ar+ ion sputtering of a pre-condensed Ar-M matrix (where M, is typically a metal such as Ag). Each Ar+ ion produces a collision cascade and thus the formation of metal clusters is in the matrix, which are then sputtered out. Here we present an experimental and computational investigation of the cluster emission process, specifically its dependence on the Ar+ ion angle of incidence and the cluster emission angle. We find the incidence angle strongly influences the emerging cluster flux, which is assigned to the spatial location of the deposited primary ion energy relative to the cluster into the matrix. We also found an approximately constant angle between the incident ion beam and the peak in the emitted cluster distribution, with value between 99° and 109°.
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Angular dependence of nanoparticle generation in the matrix assembly cluster source
Abstract
The matrix assembly cluster source (MACS) represents a bridge between conventional instruments for cluster beam deposition (CBD) and the level of industrial production. The method is based on Ar+ ion sputtering of a pre-condensed Ar-M matrix (where M, is typically a metal such as Ag). Each Ar+ ion produces a collision cascade and thus the formation of metal clusters is in the matrix, which are then sputtered out. Here we present an experimental and computational investigation of the cluster emission process, specifically its dependence on the Ar+ ion angle of incidence and the cluster emission angle. We find the incidence angle strongly influences the emerging cluster flux, which is assigned to the spatial location of the deposited primary ion energy relative to the cluster into the matrix. We also found an approximately constant angle between the incident ion beam and the peak in the emitted cluster distribution, with value between 99° and 109°.
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Acknowledgements
We thank the EPSRC, the Leverhulme Trust, Innovate UK and the EU H2020 project CritCat (project ID: 686053) for their financial support. Research performed at the University of Helsinki was supported by the EU project M4F (project ID: 755039). The authors are also grateful to the Finnish IT Centre of Science, CSC, for grants of computational time. The MACS concept is the subject of the following patent applications: Palmer, R. E.; PCT Patent Application No. WO2013017870; Europe Patent Application No. EP2739565; China Patent Application No. CN103857618; Japan Patent Application No. JP6316748; U.S. Patent Application No. US10233545.
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