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Electrical and optical enhancements of single-layer semiconducting materials such as transition metal dichalcogenides have recently been studied to achieve sensitive properties via external treatments, such as the formation of organic/inorganic protecting layers on field-effect transistors (FETs), thermal annealing, and nano-dot doping of sensors and detectors. Here, we propose a new analytical approach to electrical and optical enhancement through a passivation process using atomic layer deposition (ALD), and demonstrate a synthesized MoS2 monolayer incorporated with Al atoms in an Al2O3 passivation layer. The incorporated Al atoms in the MoS2 monolayer are clearly observed by spherical aberration-corrected scanning transmission electron microscopy (Cs-STEM) and TEM-energy-dispersive X-ray spectroscopy results. We demonstrate that the chemically incorporated FETs exhibit highly enhanced mobilities of approximately 3.7 cm2·V-1·s-1, forty times greater than that of as-synthesized MoS2, with a three-fold improvement in the photoluminescence properties.


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Enhanced electrical and optical properties of single-layered MoS2 by incorporation of aluminum

Show Author's information Hyung-Jun Kim1,2Suk Yang1,2Hojoong Kim1,2Jin Young Moon2Kyung Park2Yun-Jin Park1,2Jang-Yeon Kwon1,2( )
School of Integrated TechnologyYonsei UniversityYeonsu-gu406-840Incheon, Republic of Korea
Yonsei Institute of Convergence TechnologyYeonsu-gu406-840Incheon, Republic of Korea

Abstract

Electrical and optical enhancements of single-layer semiconducting materials such as transition metal dichalcogenides have recently been studied to achieve sensitive properties via external treatments, such as the formation of organic/inorganic protecting layers on field-effect transistors (FETs), thermal annealing, and nano-dot doping of sensors and detectors. Here, we propose a new analytical approach to electrical and optical enhancement through a passivation process using atomic layer deposition (ALD), and demonstrate a synthesized MoS2 monolayer incorporated with Al atoms in an Al2O3 passivation layer. The incorporated Al atoms in the MoS2 monolayer are clearly observed by spherical aberration-corrected scanning transmission electron microscopy (Cs-STEM) and TEM-energy-dispersive X-ray spectroscopy results. We demonstrate that the chemically incorporated FETs exhibit highly enhanced mobilities of approximately 3.7 cm2·V-1·s-1, forty times greater than that of as-synthesized MoS2, with a three-fold improvement in the photoluminescence properties.

Keywords: MoS2, atomic layer deposition, chemical vapor deposition, aluminum, incorporation

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Publication history
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Acknowledgements

Publication history

Received: 10 February 2017
Revised: 10 May 2017
Accepted: 16 May 2017
Published: 10 August 2017
Issue date: February 2018

Copyright

© Tsinghua University Press and Springer-Verlag GmbH Germany 2017

Acknowledgements

Acknowledgements

This research was supported by the MSIT (Ministry of Science and ICT), Korea, under the ICT Consilience Creative program (IITP-2017-2017-0-01015) supervised by the IITP (Institute for information & communications Technology Promotion).

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