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Erratum

Erratum to: Strategies to obtain pattern fidelity in nanowire growth from large-area surfaces patterned using nanoimprint lithography

Gaute Otnes, Magnus Heurlin, Mariusz Graczyk, Jesper Wallentin†, Daniel Jacobsson‡, Alexander Berg, Ivan Maximov, Magnus T. Borgström( )
Solid State PhysicsLund UniversityBox 118S-221 00LundSweden

† Present address: Division of Synchrotron Radiation Research, Lund University, Box 118, S-221 00 Lund, Sweden

‡ Present address: nCHREM/Centre for Analysis and Synthesis, Lund University, Box 124, S-221 00 Lund, Sweden

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The online version of the original article can be found at:
https://doi.org/10.1007/s12274-016-1165-z

Keywords

semiconductornanowirenanoimprint lithographymetal–organic vapor phase epitaxial (MOVPE)patterning

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Nano Research
Volume 10 Issue 2,
February 2017
Pages 729-729
DOI: 10.1007/s12274-016-1379-0

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Cite this article:
Otnes G, Heurlin M, Graczyk M, et al. Erratum to: Strategies to obtain pattern fidelity in nanowire growth from large-area surfaces patterned using nanoimprint lithography. Nano Research, 2017, 10(2): 729. https://doi.org/10.1007/s12274-016-1379-0

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Published: 27 January 2017
© Tsinghua University Press and Springer-Verlag Berlin Heidelberg 2016