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Research Article

Influence of carrier concentration on the resistive switching characteristics of a ZnO-based memristor

Yihui Sun1, Xiaoqin Yan1( ), Xin Zheng1, Yichong Liu1, Yanwei Shen1, Yue Zhang1,2 ( )
State Key Laboratory for Advanced Metals and MaterialsSchool of Materials Science and EngineeringUniversity of Science and Technology BeijingBeijing100083China
Beijing Municipal Key Laboratory of New Energy Materials and TechnologiesUniversity of Science and Technology BeijingBeijing100083China
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Abstract

Sandwich-style memristor devices were synthesized by electrochemical deposition with a ZnO film serving as the active layer between Al-doped ZnO (AZO) and Au electrodes. The carrier concentration of the ZnO films is controlled by adding HNO3 during the growth process. A resulting increase in carrier concentration from 1017 to 1019 cm–3 was observed, along with a corresponding drop in the on–off ratio from 6, 437% to 100%. The resistive switching characteristics completely disappeared when the carrier concentration was above 1019 cm–3, making it unsuitable for a memory device. The decreasing switching ratio is attributed to a reduction in the driving force for oxygen vacancy drift. Systematic analysis of the migration of oxygen vacancies is presented, including the concentration gradient and electrical potential gradient. Such oxygen vacancy migration dynamics provide insight into the mechanisms of the oxygen vacancy drift and provide valuable information for industrial production of memristor devices.

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Nano Research
Pages 1116-1124

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Cite this article:
Sun Y, Yan X, Zheng X, et al. Influence of carrier concentration on the resistive switching characteristics of a ZnO-based memristor. Nano Research, 2016, 9(4): 1116-1124. https://doi.org/10.1007/s12274-016-1006-0

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Received: 03 November 2015
Revised: 26 December 2015
Accepted: 05 January 2016
Published: 01 March 2016
© Tsinghua University Press and Springer-Verlag Berlin Heidelberg 2016