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Research Article

Direct writing of graphene patterns and devices on graphene oxide films by inkjet reduction

Yang Su§Shuai Jia§Jinhong Du( )Jiangtan YuanChang LiuWencai RenHuiming Cheng( )
Shenyang National Laboratory for Materials ScienceInstitute of Metal ResearchChinese Academy of Sciences72 Wenhua RoadShenyang110016China

§ These authors contributed equally to this work.

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Abstract

Direct writing of graphene patterns and devices may significantly facilitate the application of graphene-based flexible electronics. In terms of scalability and cost efficiency, inkjet printing is very competitive over other existing directwriting methods. However, it has been challenging to obtain highly stable and clog-free graphene-based ink. Here, we report an alternative and highly efficient technique to directly print a reducing reagent on graphene oxide film to form conductive graphene patterns. By this "inkjet reduction" method, without using any other microfabrication technique, conductive graphene patterns and devices for various applications are obtained. The ionic nature of the reductant ink makes it clog-free and stable for continuous and large-area printing. The method shows self-limited reduction feature, which enables electrical conductivity of graphene patterns to be tuned within 5 orders of magnitude, reaching as high as 8, 000 S·m–1. Furthermore, this method can be extended to produce noble metal/graphene composite patterns. The devices, including transistors, biosensors, and surfaceenhanced Raman scattering substrates, demonstrate excellent functionalities. This work provides a new strategy to prepare large-area graphene-based devices that is low-cost and highly efficient, promising to advance research on graphenebased flexible electronics.

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Nano Research
Pages 3954-3962

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Cite this article:
Su Y, Jia S, Du J, et al. Direct writing of graphene patterns and devices on graphene oxide films by inkjet reduction. Nano Research, 2015, 8(12): 3954-3962. https://doi.org/10.1007/s12274-015-0897-5

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Received: 26 July 2015
Revised: 26 August 2015
Accepted: 08 September 2015
Published: 28 October 2015
© Tsinghua University Press and Springer-Verlag Berlin Heidelberg 2015