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Research Article

An exchange intercalation mechanism for the formation of a two-dimensional Si structure underneath graphene

Yi Cui1Junfeng Gao2Li Jin1Jijun Zhao2Dali Tan1Qiang Fu1( )Xinhe Bao1( )
State Key Laboratory of CatalysisDalian Institute of Chemical Physicsthe Chinese Academy of SciencesDalian116023China
Key Laboratory of Materials Modification by LaserIon and Electron Beams (Dalian University of Technology)Ministry of EducationDalian116024China
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Abstract

A two-dimensional (2D) Si film can form between a graphene overlayer and a Ru(0001) substrate through an intercalation process. At the graphene/2D-Si/Ru(0001) surface, the topmost graphene layer is decoupled from the Ru substrate and becomes quasi-freestanding. The interfacial Si layers show high stability due to the protection from the graphene cover. Surface science measurements indicate that the surface Si atoms can penetrate through the graphene lattice, and density functional theory calculations suggest a Si-C exchange mechanism facilitates the penetration of Si at mild temperatures. The new mechanism may be involved for other elements on graphene, if they can bond strongly with carbon. This finding opens a new route to form 2D interfacial layers between graphene and substrates.

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Nano Research
Pages 352-360

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Cite this article:
Cui Y, Gao J, Jin L, et al. An exchange intercalation mechanism for the formation of a two-dimensional Si structure underneath graphene. Nano Research, 2012, 5(5): 352-360. https://doi.org/10.1007/s12274-012-0215-4

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Received: 04 January 2012
Revised: 17 March 2012
Accepted: 26 March 2012
Published: 11 May 2012
© Tsinghua University Press and Springer-Verlag Berlin Heidelberg 2012