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We demonstrate the fabrication of high-density aligned graphene nanoribbon (GNR) arrays by plasma etching of graphene sheets through a nanomask derived from self-assembled poly (styrene-block-dimethylsiloxane) (PS–PDMS) diblock copolymer films. This approach produces parallel GNR (~12 nm wide) arrays at ~35 nm pitch. Microscopy and polarized Raman spectroscopy are used to reveal the high-degree of alignment of GNRs. Electrical measurements show that parallel GNRs in a 1 μm wide region can deliver ~0.38 mA current at a source–drain bias of 1 V. This novel patterning approach allows for the fabrication of densely aligned GNR arrays on various substrates and could provide a route to large scale integration of GNRs into nanoelectronics, optoelectronics and biosensors.

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Publication history
Copyright
Acknowledgements

Publication history

Received: 29 January 2012
Accepted: 08 March 2012
Published: 23 March 2012
Issue date: April 2012

Copyright

© Tsinghua University Press and Springer-Verlag Berlin Heidelberg 2012

Acknowledgements

Acknowledgements

This work was supported by MARCO MSD, Intel, ONR MURI on graphene, and Samsung Electronics.

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