RT Journal Article A1 Dongyun GUO,Akihiko ITO,Takashi GOTO,Rong TU,Chuanbin WANG,Qiang SHEN,Lianmeng ZHANG; AD State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, and School of Materials Science and Engineering, 中国 ; Institute for Materials Research, 日本 ; Institute for Materials Research, 日本 ; Institute for Materials Research, 日本 ; Institute for Materials Research, 日本 ; State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, and School of Materials Science and Engineering, 中国 ; State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, and School of Materials Science and Engineering, 中国 ; State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, and School of Materials Science and Engineering, 中国 T1 Preparation of rutile TiO2 thin films by laser chemical vapor deposition method YR 2013 IS 2 vo 2 OP 162-OP 166 K1 microstructure;laser power;rutile TiO2 thin film;laser chemical vapor deposition (LCVD);total pressure AB TiO2 thin films were prepared on Pt/Ti/SiO2/Si substrate by laser chemical vapor deposition (LCVD) method. The effects of laser power (PL) and total pressure (ptot) on the microstructure of TiO2 thin films were investigated. The deposition temperature (Tdep) was mainly affected by PL, increasing with PL increasing. The single-phase rutile TiO2 thin films with different morphologies were obtained. The morphologies of TiO2 thin films were classified into three typical types, including the powdery, Wulff-shaped and granular microstructures. ptot and Tdep were the two critical factors that could be effectively used for controlling the morphology of the films. SN 2226-4108 LA EN