@article{XIONG2009, 
author = {Wei XIONG and Jinyu ZHANG and Min-Chun Tsai and Yan WANG and Zhiping YU},
title = {ILT Approach for Compensating 3-D Mask Effects},
year = {2009},
journal = {Tsinghua Science and Technology},
volume = {14},
number = {1},
pages = {68-74},
keywords = {inverse lithography technique (ILT), 3-D mask effect, simulated annealing},
url = {https://www.sciopen.com/article/10.1016/S1007-0214(09)70009-4},
doi = {10.1016/S1007-0214(09)70009-4},
abstract = {As mask features scale to smaller dimensions, the so-called "3-D mask effects" which have mostly been neglected before, become important. This paper properly models the 3-D thick mask effects, and then analyses the object-based inverse lithography technique using a simulated annealing algorithm to determine the mask shapes that produce the desired on-wafer results. Evaluations against rigorous simulations show that the synthesized masks provide good image fidelity up to 0.94, and this approach gives improved accuracy and faster results than existing methods.}
}