@article{Chen2026, 
author = {Lijuan Chen and Sihai Luo and Dongxu Yang and Qi Yuan and Yingfang Zhang and Bai Sun and Jian Lv and Xiaoliang Chen and Hongmiao Tian and Xiangming Li and Fenggang Ren and Yi Lv and Stefan A Maier and Jinyou Shao},
title = {Scalable and reproducible sub-5 nm manufacturing for next-generation devices},
year = {2026},
journal = {International Journal of Extreme Manufacturing},
volume = {8},
number = {2},
keywords = {nanostructures, nanofabrication, lithography, devices, sub-5 nm},
url = {https://www.sciopen.com/article/10.1088/2631-7990/ae2578},
doi = {10.1088/2631-7990/ae2578},
abstract = {The capability to consistently manufacture structures with sub-5 nm features has greatly accelerated scientific advancements in nanoscience and nanotechnology. However, most current methods are serial processes that are time-consuming and impractical for large-scale manufacturing at the sub-5 nm level. The challenge of achieving scalable and reproducible production of sub-5 nm structures poses a significant hurdle for both fundamental research and commercial implementations. In this review, we explore some representative sub-5 nm fabrication strategies, focusing on approaches that facilitate scalable and reproducible manufacturing. We highlight the most promising techniques such as extreme ultraviolet lithography, electron beam lithography, directed self-assembly and atomic layer lithography that hold potential breakthroughs in both research and industry, based on criteria such as resolution, scalability, reproducibility and their applicability in photonics such as surface-enhanced spectroscopies, terahertz science, and nonlinear optics, as well as in electronics such as quantum devices, molecular devices and memory devices. The evolution of scalable and reproducible sub-5 nm manufacturing methods will ultimately revolutionize next-generation devices, encompassing quantum technologies, neuromorphic computing chips, and the mass production of integrated circuits.}
}