@article{Jiao2023, 
author = {Binzhang Jiao and Fayu Chen and Yuncheng Liu and Xuhao Fan and Shaoqun Zeng and Qi Dong and Leimin Deng and Hui Gao and Wei Xiong},
title = {Acousto-optic scanning spatial-switching multiphoton lithography},
year = {2023},
journal = {International Journal of Extreme Manufacturing},
volume = {5},
number = {3},
pages = {035008},
keywords = {3D nano-printing, acousto-optic scanning, aberration-free wavefront, spatial-switching},
url = {https://www.sciopen.com/article/10.1088/2631-7990/ace0a7},
doi = {10.1088/2631-7990/ace0a7},
abstract = {Nano-3D printing has obtained widespread attention owing to its capacity to manufacture end-use components with nano-scale features in recent years. Multiphoton lithography (MPL) is one of the most promising 3D nanomanufacturing technologies, which has been widely used in manufacturing micro-optics, photonic crystals, microfluidics, meta-surface, and mechanical metamaterials. Despite of tremendous potential of MPL in laboratorial and industrial applications, simultaneous achievement of high throughput, high accuracy, high design freedom, and a broad range of material structuring capabilities remains a long-pending challenge. To address the issue, we propose an acousto-optic scanning with spatial-switching multispots (AOSS) method. Inertia-free acousto-optic scanning and nonlinear swept techniques have been developed for achieving ultrahigh-speed and aberration-free scanning. Moreover, a spatial optical switch concept has been implemented to significantly boost the lithography throughput while maintaining high resolution and high design freedom. An eight-foci AOSS system has demonstrated a record-high 3D printing rate of 7.6 × 107 voxel s−1, which is nearly one order of magnitude higher than earlier scanning MPL, exhibiting its promise for future scalable 3D nanomanufacturing.}
}