@article{Li2022, 
author = {Xiao-Xi Li and Guang Zeng and Yu-Chun Li and Qiu-Jun Yu and Meng-Yang Liu and Li-Yuan Zhu and Wenjun Liu and Ying-Guo Yang and David Wei Zhang and Hong-Liang Lu},
title = {Highly sensitive and stable β-Ga2O3 DUV phototransistor with local back-gate structure and its neuromorphic application},
year = {2022},
journal = {Nano Research},
volume = {15},
number = {10},
pages = {9359-9367},
keywords = {stability, responsivity, local back-gate, photonic synapse, β-Ga2O3 phototransistors},
url = {https://www.sciopen.com/article/10.1007/s12274-022-4574-1},
doi = {10.1007/s12274-022-4574-1},
abstract = {Deep ultraviolet (DUV) phototransistors are key integral of optoelectronics bearing a wide spectrum of applications in flame sensor, military detector, oil spill detection, biological sensor, and artificial intelligence fields. In order to further improve the responsivity of UV photodetectors based on β-Ga2O3, in present work, high-performance β-Ga2O3 phototransistors with local back-gate structure were experimentally demonstrated. The phototransistor shows excellent DUV photoelectrical performance with a high responsivity of 1.01 × 107 A/W, a high external quantum efficiency of 5.02 × 109%, a sensitive detectivity of 2.98 × 1015 Jones, and a fast rise time of 0.2 s under 250 nm illumination. Besides, first-principles calculations reveal the decent stability of β-Ga2O3 nanosheet against oxidation and humidity without significant performance degradations. Additionally, the hexagonal boron nitride (h-BN)/β-Ga2O3 phototransistor can behave as a photonic synapse with ultralow power consumption of ~ 9.6 fJ per spike, which shows its potential for neuromorphic computing tasks such as facial recognition. This β-Ga2O3 phototransistor will provide a perspective for the next generation optoelectrical systems.}
}