@article{Ullah2021, 
author = {Sami Ullah and Xiaoqin Yang and Huy Q. Ta and Maria Hasan and Alicja Bachmatiuk and Klaudia Tokarska and Barbara Trzebicka and Lei Fu and Mark H. Rummeli},
title = {Graphene transfer methods: A review},
year = {2021},
journal = {Nano Research},
volume = {14},
number = {11},
pages = {3756-3772},
keywords = {high-quality transfer, application-compatible substrate, graphene technology},
url = {https://www.sciopen.com/article/10.1007/s12274-021-3345-8},
doi = {10.1007/s12274-021-3345-8},
abstract = {Graphene is a material with unique properties that can be exploited in electronics, catalysis, energy, and bio-related fields. Although, for maximal utilization of this material, high-quality graphene is required at both the growth process and after transfer of the graphene film to the application-compatible substrate. Chemical vapor deposition (CVD) is an important method for growing high-quality graphene on non-technological substrates (as, metal substrates, e.g., copper foil). Thus, there are also considerable efforts toward the efficient and non-damaging transfer of quality of graphene on to technologically relevant materials and systems. In this review article, a range of graphene current transfer techniques are reviewed from the standpoint of their impact on contamination control and structural integrity preservation of the as-produced graphene. In addition, their scalability, cost- and time-effectiveness are discussed. We summarize with a perspective on the transfer challenges, alternative options and future developments toward graphene technology.}
}