@article{Jiao2012, 
author = {Liying Jiao and Liming Xie and Hongjie Dai},
title = {Densely Aligned Graphene Nanoribbons at ~35 nm Pitch},
year = {2012},
journal = {Nano Research},
volume = {5},
number = {4},
pages = {292-296},
keywords = {Graphene nanoribbons, aligned array, diblock copolymer, plasma etching},
url = {https://www.sciopen.com/article/10.1007/s12274-012-0209-2},
doi = {10.1007/s12274-012-0209-2},
abstract = {We demonstrate the fabrication of high-density aligned graphene nanoribbon (GNR) arrays by plasma etching of graphene sheets through a nanomask derived from self-assembled poly (styrene-block-dimethylsiloxane) (PS–PDMS) diblock copolymer films. This approach produces parallel GNR (~12 nm wide) arrays at ~35 nm pitch. Microscopy and polarized Raman spectroscopy are used to reveal the high-degree of alignment of GNRs. Electrical measurements show that parallel GNRs in a 1 μm wide region can deliver ~0.38 mA current at a source–drain bias of 1 V. This novel patterning approach allows for the fabrication of densely aligned GNR arrays on various substrates and could provide a route to large scale integration of GNRs into nanoelectronics, optoelectronics and biosensors.}
}