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Journal of Advanced Ceramics 2013, 2(2): 162-166 https://doi.org/10.1007/s40145-013-0056-y
Research Article | Open Access | Issue | Published: 04 June 2013

Preparation of rutile TiO2 thin films by laser chemical vapor deposition method

Show Author's Information Dongyun GUOa,b,*( ),  Akihiko ITOb,  Takashi GOTOb,  Rong TUb,  Chuanbin WANGa,  Qiang SHENa,  Lianmeng ZHANGa
State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, and School of Materials Science and Engineering, Wuhan University of Technology, Wuhan 430070, China
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
Keywords:
rutile TiO2 thin film, laser chemical vapor deposition (LCVD), laser power, total pressure, microstructure
Cite this article:
GUO D, ITO A, GOTO T, et al. Preparation of rutile TiO2 thin films by laser chemical vapor deposition method. Journal of Advanced Ceramics, 2013, 2(2): 162-166. https://doi.org/10.1007/s40145-013-0056-y
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Abstract Full text About this article

TiO2 thin films were prepared on Pt/Ti/SiO2/Si substrate by laser chemical vapor deposition (LCVD) method. The effects of laser power (PL) and total pressure (ptot) on the microstructure of TiO2 thin films were investigated. The deposition temperature (Tdep) was mainly affected by PL, increasing with PL increasing. The single-phase rutile TiO2 thin films with different morphologies were obtained. The morphologies of TiO2 thin films were classified into three typical types, including the powdery, Wulff-shaped and granular microstructures. ptot and Tdep were the two critical factors that could be effectively used for controlling the morphology of the films.


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About this article

Preparation of rutile TiO2 thin films by laser chemical vapor deposition method

Show Author's information Dongyun GUOa,b,*( ), Akihiko ITOb, Takashi GOTOb, Rong TUb, Chuanbin WANGa, Qiang SHENa, Lianmeng ZHANGa
State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, and School of Materials Science and Engineering, Wuhan University of Technology, Wuhan 430070, China
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan

Abstract

TiO2 thin films were prepared on Pt/Ti/SiO2/Si substrate by laser chemical vapor deposition (LCVD) method. The effects of laser power (PL) and total pressure (ptot) on the microstructure of TiO2 thin films were investigated. The deposition temperature (Tdep) was mainly affected by PL, increasing with PL increasing. The single-phase rutile TiO2 thin films with different morphologies were obtained. The morphologies of TiO2 thin films were classified into three typical types, including the powdery, Wulff-shaped and granular microstructures. ptot and Tdep were the two critical factors that could be effectively used for controlling the morphology of the films.

Keywords: rutile TiO2 thin film, laser chemical vapor deposition (LCVD), laser power, total pressure, microstructure

References(24)

[1]
Diebold U. The surface science of titanium dioxide. Surf Sci Rep 2003, 48: 53–229.
DOI Google Scholar
[2]
Kadoshima M, Hiratani M, Shimamoto Y, et al. Rutile-type TiO2 thin film for high-k gate insulator. Thin Solid Films 2003, 424: 224–228.
DOI Google Scholar
[3]
Hanaor DAH, Sorrell CC. Review of the anatase to rutile phase transformation. J Mater Sci 2011, 46: 855–874.
DOI Google Scholar
[4]
Fujishima A, Zhang XT, Tryk DA. TiO2 photocatalysis and related surface phenomena. Surf Sci Rep 2008, 63: 515–582.
DOI Google Scholar
[5]
Fujishima A, Honda K. Electrochemical photolysis of water at a semiconductor electrode. Nature 1972, 238: 37–38.
DOI Google Scholar
[6]
Parker RA. Static dielectric constant of rutile (TiO2), 1.6–1060°K. Phys Rev 1961, 124: 1719–1722.
DOI Google Scholar
[7]
Kim SK, Kim W-D, Kim K-M, et al. High dielectric constant TiO2 thin films on a Ru electrode grown at 250 ℃ by atomic-layer deposition. Appl Phys Lett 2004, 85: 4112.10.1063/1.1812832
DOI Google Scholar
[8]
Alexandrov P, Koprinarova J, Todorov D. Dielectric properties of TiO2-films reactively sputtered from Ti in an RF magnetron. Vacuum 1996, 47: 1333–1336.
DOI Google Scholar
[9]
Rausch N, Burte EP. Thin TiO2 films prepared by low pressure chemical vapor deposition. J Electrochem Soc 1993, 140: 145–149.
DOI Google Scholar
[10]
Zhang QM, Griffin GL. Gas-phase kinetics for TiO2 CVD: Hot-wall reactor results. Thin Solid Films 1995, 263: 65–71.
DOI Google Scholar
[11]
Kim JY, Jung HS, No JH, et al. Influence of anatase–rutile phase transformation on dielectric properties of sol–gel derived TiO2 thin films. J Electroceram 2006, 16: 447–451.
DOI Google Scholar
[12]
Oja I, Mere A, Krunks M, et al. Structural and electrical characterization of TiO2 films grown by spray pyrolysis. Thin Solid Films 2006, 515: 674–677.
DOI Google Scholar
[13]
Chao S, Dogan F. Processing and dielectric properties of TiO2 thick films for high-energy density capacitor applications. Int J Appl Ceram Tec 2011, 8: 1363–1373.
DOI Google Scholar
[14]
Gao M, Ito A, Tu R, et al. Microcolumnar and granular structures of TiO2 films prepared by laser CVD using Nd:YAG laser. Key Eng Mat 2012, 508: 287–290.
DOI Google Scholar
[15]
Goto T, Kimura T. Laser chemical vapor deposition of thick oxide coatings. Key Eng Mat 2006, 317–318: 495–500.
DOI Google Scholar
[16]
Guo DY, Goto T, Wang CB, et al. High-speed growth of (103)-oriented Ba2TiO4 film by laser chemical vapor deposition. Mater Lett 2012, 70: 135–137.
DOI Google Scholar
[17]
Guo DY, Ito A, Tu R, et al. High-speed epitaxial growth of BaTi2O5 films and their in-plane orientations. Appl Surf Sci 2012, 259: 178–185.
DOI Google Scholar
[18]
Guo DY, Ito A, Goto T, et al. Dielectric properties of Ba4Ti13O30 film prepared by laser chemical vapor deposition. J Mater Sci 2012, 47: 1559–1561.
DOI Google Scholar
[19]
Guo DY, Goto T, Wang CB, et al. High-speed preparation and dielectric properties of BaTi4O9 film by laser chemical vapor deposition. J Mater Sci: Mater El 2012, 23: 897–900.
DOI Google Scholar
[20]
Guo DY, Ito A, Goto T, et al. Preparation of TiO2 thick film by laser chemical vapor deposition method. J Mater Sci: Mater El 2012, .
DOI Google Scholar
[21]
Guo DY, Ito A, Goto T, et al. Effect of laser power on orientation and microstructure of TiO2 films prepared by laser chemical vapor deposition method. Mater Lett 2013, 93: 179–182.
DOI Google Scholar
[22]
Zeng JH, Yu YL, Wang YF, et al. High-density arrays of low-defect-concentration zinc oxide nanowire grown on transparent conducting oxide glass substrate by chemical vapor deposition. Acta Mater 2009, 57: 1813–1820.
DOI Google Scholar
[23]
Kimura T. High-speed deposition of yttria-stabilized zirconia and titania films by laser chemical vapor deposition. J Ceram Soc Jpn 2006, 114: 161–166.
DOI Google Scholar
[24]
Hong ZS, Wei MD, Lan TB, et al. Self-assembled nanoporous rutile TiO2 mesocrystals with tunable morphologies for high rate lithium-ion batteries. Nano Energy 2012, 1: 466–471.
DOI Google Scholar
Publication history
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Publication history

Received: 13 January 2013
Revised: 16 March 2013
Accepted: 18 March 2013
Published: 04 June 2013
Issue date: June 2013

Copyright

© The author(s) 2013

Acknowledgements

This work was supported in part by the Global COE Program of the Materials Integration, Tohoku University, and the International Science and Technology Cooperation Program of China (Grant No. 2009DFB50470). This work was also supported in part by the International Science and Technology Cooperation Project of Hubei Province (Grant No. 2010BFA017) and the 111 Project of China (Grant No. B13035).

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Open Access: This article is distributed under the terms of the Creative Commons Attribution Noncommercial License which permits any noncommercial use, distribution, and reproduction in any medium, provided the original author(s) and source are credited.

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